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Entegris, Inc.: Entegris Announces New Post-CMP Cleaning Solutions for Advanced Semiconductor Manufacturing

PlanarClean® AG Products Are Optimized for Copper and Tungsten Processes at 10 nm and BelowBILLERICA, Mass., Jan. 26, 2016 (GLOBE NEWSWIRE) -- Entegris, Inc.
(NASDAQ:ENTG), a leader in yield-enhancing materials and solutions for highly
advanced manufacturing environments, today announced new post-chemical
mechanical planarization (post-CMP) cleaning solutions for semiconductor
manufacturing. The new PlanarClean®

AG family of products were designed for use in 10 nm processes and below, and
add to Entegris' leading portfolio of post-CMP cleaning solutions.

"Entegris has been the industry leader in post-CMP cleaning for many years.
Our PlanarClean family products have been widely used in wafer fabs around
the world. To address greater complexity of wafer production at the
leading-edge nodes due to the addition of many new materials, such as cobalt
and tungsten, we carefully re-formulated our PlanarClean solution to provide
superior cleaning without damaging advanced films or new materials," said
Cuong Tran, director of post-CMP cleans for Entegris. "PlanarClean AG meets
the needs for advanced processes, while also conforming to new safety
guidelines outlined by our customers."

The CMP process in silicon wafer production consists of a mechanical polishing
step which utilizes a chemical slurry formulation to remove unwanted
conductive or dielectric materials from the surface of the integrated device,
achieving a flat and smooth surface upon which additional layers of
integrated circuitry are built. The post-CMP cleaning step removes
nanoparticles to minimize potential wafer defects while maintaining the
integrity of the layers of materials already in place.

Changes to the number and types of films and materials exposed during cleaning
in advanced processes have highlighted a need for specifically formulated
cleans. In addition, changes to the particles used in slurries have rendered
many of the traditional post-CMP cleaners ineffective and inefficient for
leading-edge technologies, specifically in Front-End-of-Line (FEOL)
processes. These challenges are now pushing semiconductor manufacturers to
consider formulated cleans over commodity cleans.

PlanarClean AG formulated solutions meet these needs by providing one-step,
superior cleaning in advanced processes that include copper, cobalt and
tungsten, while protecting the underlying thin films and materials. Its
proprietary formulation offers increased performance through enhanced
reliability and yield, low to zero corrosion and defects and increased queue
time. In addition, PlanarClean AG provides a cost-of-ownership advantage by
reducing the amount of chemistry required in the cleaning step, and meets the
latest EHS safety requirements for fab chemistries. The products have been
successfully evaluated in multiple leading-edge fabs and are currently
available to all customers.

For more information, please visit the Entegris booth at SEMICON® Korea, Hall
D, Booth #5612, through Friday, January, 29th, or contact your local Entegris
representative or

About Entegris

Entegris is a leading provider of a wide range of products for purifying,
protecting, and transporting critical materials used in processing and
manufacturing in the semiconductor and other high-tech industries. Entegris
is ISO-9001 certified and has manufacturing, customer service and/or research
facilities in the United States, China, France, Germany, Israel, Japan,
Malaysia, Singapore, South Korea and Taiwan. Additional information may be
found at

, Entegris Rings Design
, Creating a Material Advantage

and PlanarClean

are all trademarks of Entegris, Inc. SEMICON

is a trademark of Semiconductor Equipment and Materials International

Company Contact:
Andrew DePoy
Brand & Marcom Mgr.
T +1 480 290 8748

Media Contact:
Lora Martinez
Impress Labs


This announcement is distributed by NASDAQ OMX Corporate Solutions on behalf of NASDAQ OMX Corporate Solutions clients.
The issuer of this announcement warrants that they are solely responsible for the content, accuracy and originality of the information contained therein.
Source: Entegris, Inc. via Globenewswire


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